Previous Article Next Article Table of Contents Advanced Materials, Vol.14, No.19, 1369-1373, 2002 DOI10.1002/1521-4095(20021002)14:19<1369::AID-ADMA1369>3.0.CO;2-I Export Citation A new type of low-kappa dielectric films based on polysilsesquioxanes Su RQ, Muller TE, Prochazka J, Lercher JA [Referenced By] Please enable JavaScript to view the comments powered by Disqus.
