ZnO micropatterning under very mild conditions is presented. Photolysis (using a mask) of Si-C bonds in a self-assembled phenylsilane layer yields a patterned phenyl/hydroxy surface. ZnO is selectively deposited at 55 degreesC on the phenyl domains by electroless deposition using a Pd catalyst adhered to the surface. The viability of the ZnO pattern as a phosphor is illustrated by the visible light cathodoluminescence image shown in the Figure and on the cover.