Microstructure array on Si and SiOx generated by micro-contact printing, wet chemical etching and reactive ion etching

Zhang H; Amro NA; Disawal S; Elghanian R; Shile R; Fragala J

Applied Surface Science, Vol.253, No.4, 1960-1963, 2006

DOI10.1016/j.apsusc.2006.03.045 Export Citation

Microstructure array on Si and SiOx generated by micro-contact printing, wet chemical etching and reactive ion etching

Zhang H, Amro NA, Disawal S, Elghanian R, Shile R, Fragala J

A method, combining micro-contact printing (mu LCP), wet chemical etching and reactive ion etching (RIE), is reported to fabricate microstructures on Si and SiOx. Positive and negative structures were generated based on different stamps used for mu CR The reproducibility of the obtained microstructures shows the methodology reported herein could be useful in Micro-Electro-Mechanical Systems (MEMS), optical and biological sensing applications. (c) 2006 Elsevier B.V. All rights reserved.

Keywords:micro-contact printing;wet chemical etching;reactive ion etching;silicon;silicon oxide