PLZT thin films with different thickness were deposited in situ on platinum coated silicon substrates using a multi-target sputtering system. The purpose was to grow (111)-textured PLZT films on Pt (111). To this aim, the role of some key parameters on both crystalline quality and electrical properties was investigated. An ultra-thin TiO2 seeding layer was deposited, prior to PLZT, which strongly affected the crystallographic orientation of the films. The relation between temperature deposition and film crystallinity is analysed. TEM observations show the presence of some very small grains of Zr0.9La0.1O1.95 at the film bottom interface. In the range of thickness investigated, the plot of the inverse capacitance as a function of the film thickness split up into two different curves, each with a linear shape, which however allows determination of a single value of interface capacitance. Above a thickness of 400-500 nm a saturation of the dielectric properties seems to be reached. (c) 2006 Elsevier B.V. All rights reserved.