We prepared high quality Au(111) film on Si wafer through the spin coating and thermal decomposition of a gold ink, spin-coated-and-fired (SCAF) An film. The X-ray measurements, XRD and pole-figure analysis, showed that the SCAF Au film has a (111) out-of-plane orientation with a random in-plane orientation. In order to confirm the chemical activity of the SCAF An film, we demonstrate the formation of patterned structures with the film by using soft lithography technique. The chemical activities of this physically stable SCAF Au film to the alkanethiols were at least equivalent those of physically deposited the An films. The possibility of the mass production of micro patterned structure with the SCAF Au film was also demonstrated over the wide region on Si wafer by the microcontact lithography. These suggest that the Au film will help the easy fabrication of various nanosized devices on Si wafer and other substrates. (c) 2005 Elsevier B.V. All rights reserved.