Applied Surface Science, Vol.211, No.1-4, 379-385, 2003
Microstructural analysis of carbon films obtained from C-60 fullerene ion beams
Carbon films have been produced by accelerating C-60(+) ions on silicon substrates with energies between 100 and 800 eV. Furthermore some samples have been vacuum-annealed at 600degreesC. The samples have been characterized by Raman and positron annihilation spectroscopies (RS-PAS). The measurements for the as-deposited material show that there is a coexistence of polymerized fullerenes and amorphous-carbon islands and that the structure depends on the energy of the incident ions. At low energies, fullerenes are deposited preserving the molecular identity and some intermolecular covalent bonds begin to insinuate; at higher energies, the amount of these covalent bonds increases and the amorphous islands predominate. After the annealing process, the amorphous phase organizes in graphitic clusters and the unbroken C-60 cages are transformed back to pristine and slightly polymerized C-60. (C) 2003 Elsevier Science B.V. All rights reserved.
Keywords:C-60 fullerene;ion beam deposition;thin film;Raman spectra;positron annihilation spectroscopy