Applied Surface Science, Vol.185, No.1-2, 47-51, 2001
In situ RHEED monitor of the growth of epitaxial anatase TiO2 thin films
Epitaxial anatase TiO2 thin films were successfully grown on (0 0 1) SrTiO3 substrates by the laser molecular-beam epitaxy (laser-MBE) method. The whole growth process is monitored by in situ reflection High-energy electron diffraction (RHEED). RHEED monitoring shows a transition from a streaky pattern to a spot pattern during deposition, indicating different growth a modes of TiO2 film. The RHEED patterns are in consistent with the RHEED intensity oscillation results. The atomic force microscopy (AFM) and X-ray diffraction (XRD) investigation show that the thin films have single crystalline orientation with roughness less than three unit cells.
Keywords:laser deposition;dielectric thin films;surfaces and interfaces;reflection high-energy electron diffraction