Applied Surface Science, Vol.175, 613-618, 2001
Quantum confinement effects in Si quantum well and dot structures fabricated from ultrathin Silicon-on-insulator wafers
Quantum confinement effects in two-dimensional(2D) Si and zero-dimensional (OD) Si structures, fabricated from silicon-on-insulator wafers, have been comparatively studied primarily by X-ray photoelectron spectroscopy (XPS), focusing on the energy shifts of the valence band maximum (VBM). As a result, it was found that the VBM obviously shifts toward higher binding energies during layer thinning of Si well and size reduction of Si dots, in accordance with quantum mechanical consideration.
Keywords:silicon;quantum well;quantum dot;silicon-on-insulator;valence band maximum;X-ray photoelectron spectroscopy