Journal of Crystal Growth, Vol.301, 766-770, 2007
Dosage dependence of Ge quantum dots grown on carbon-implanted Si substrates
Carbon implantation effects on self-assembled Ge quantum dots (QDs) have been investigated. Carbon atoms were implanted at different dosage, 9.0 X 10(14), 4.5 x 10(15), and 9.0 x 10(15) ions/cm(2) using the same acceleration energy of 20 keV. A nominal amount, 6 monolayer (ML), of Ge was grown on the substrate at different growth temperatures ranging from 500 to 600 degrees C using solid source molecular beam epitaxy. The smallest Ge QDs with a 13 nm mean lateral diameter, a 1.2 nm mean height, and an areal density of 2.0 x 10(11) cm(-2) were obtained using the lowest dosage substrate at 550 degrees C. Raman measurement is carried out to investigate the optical phonons and strain. (c) 2007 Elsevier B.V. All rights reserved.
Keywords:low-dimensional structures;molecular beam epitaxy;quantum dots;silicon germanium semiconductor