Using the ArF excimer laser-induced MOCVD method, InNxOy thin films are grown on a glass substrate. The photolytical decomposition of NH3 enables to grow them even at room temperature. It is found that the InNxOy thin films grown at a temperature less than 250 degrees C show an excellent photocatalytic decomposition of H2S under UV irradiation, while the activity of the films grown at a temperature higher than 300 degrees C is very small, less than I of that for the low-temperature films. The excellent photocatalytic activity for the 4 low-temperature films is closely related to the amorphous phase of the films. (c) 2006 Elsevier B.V. All rights reserved.