For growth of metal oxide materials, we introduce hybrid beam deposition (HBD) as a novel growth technique.,The HBD is developed by modified techniques out of pulsed laser deposition (PLD), molecular beam epitaxy (MBE), and chemical vapor deposition (CVD). For high-quality metal oxide film growth with the HBD, both a plasma created by laser ablation from a metal oxide target and a radical oxygen RF-plasma are used to efficiently increase the flux density of available reactive oxygen. For doping purpose, the evaporation or chemical gas sources are used in HBD as being in MBE or CVD. The application varieties of using HBD are very broad in synthesizing and doping metal oxide materials such as ZnO and MgO. The HBD process is illustrated by synthesizing ZnO films. (C) 2003 Elsevier B.V. All rights reserved.