Journal of Crystal Growth, Vol.251, No.1-4, 248-252, 2003
Epitaxial growth of 1.55 mu m emitting InAs quantum dashes on InP-based heterostructures by GS-MBE for long-wavelength laser applications
Self-assembled InAs quantum dashes in the InP system were grown by gas source molecular beam epitaxy. Different growth parameters like buffer material, growth temperature and layer thickness were studied using scanning electron microscopy and photoluminescence measurements. Four layers of InAs dashes were embedded as active material in a SCH laser structure. Device data of broad area and ridge waveguide lasers are presented. Broad area lasers of 100 mum width showed a transparency threshold current density of 330 A/cm(2) and an internal efficiency of 62%. (C) 2002 Elsevier Science B.V. All rights reserved.
Keywords:low dimensional structures;gas source molecular beam epitaxy;self-organized growth;quantum dashes;semiconducting III-V materials;laser diodes