Journal of Crystal Growth, Vol.246, No.1-2, 15-20, 2002
Enhanced impurity incorporation by alternate Te and S doping in GaAs prepared by intermittent injection of triethylgallium and arsine in ultra high vacuum
Enhanced incorporation of doped impurity in GaAs by alternate doping of Te and S is reported. When diethyltelluride (DETe) was injected on GaAs surface covered with S, the incorporation of Te was enhanced and it is shown that the Te concentration was increased according to the S coverage. Mechanism of enhanced impurity incorporation is discussed in view of the charge distribution in the molecules and the electronegativity difference. (C) 2002 Elsevier Science B.V. All rights reserved.
Keywords:doping;impurities;atomic layer epitaxy;gallium compounds;semiconducting gallium arsenide;semiconducting III-V materials