화학공학소재연구정보센터
Journal of Crystal Growth, Vol.237, 2041-2045, 2002
Collision processes between sputtered particles on high speed rotating substrate and atomic mass dependence of sticking coefficient
Collision processes of incident particles at a substrate surface are important factors to decide the microscopic growth processes in vapor phase. Incident particles are classified into two groups: primary particles and secondary particles. In order to investigate the momentum dependence of collision processes in the practical growth conditions, an experimental method, which was used a rotating disk as a substrate, is presented. In this report, we present sticking probability of Zr, Nb and Ta on the surface covered with cobalt atoms. The sticking probabilities of primary particles decreased with increasing the atomic masses. On the other hand, those of secondary particles did not show clear atomic mass dependence except for the momentum dependence. Final composition of deposited particles was the sum of the contributions of primary particles and secondary particles, whose ratio depended on the width of the sector because the sticking probability of secondary particles was dominated by the collision with the primary argon atoms. (C) 2002 Elsevier Science B.V. All rights reserved.