70 nm-thick (100)c, (110)c and (111)c-oriented epitaxial SrRuO3 and CaRuO3 thin films were grown on (100), (110) and (111)SrTiO3 substrates, respectively, by metal organic chemical vapor deposition (MOCVD) at 750degreesC. Thickness fringes were observed for the (100)c-and (100)c-oriented SrRuO3 films, suggesting a smooth surface for the film and the film-substrate interface. (111)c-oriented SrRuO3 and CaRuO3 films showed a rough surface compared to the (100)c- and (110)c-oriented films. Resistivity was independent of the film orientation. These films are useful as bottom electrodes for epitaxial ferroelectric thin films. (C) 2002 Elsevier Science B.V. All rights reserved.