Journal of Crystal Growth, Vol.230, No.1-2, 48-56, 2001
Numerical 3D study of FZ growth: dependence on growth parameters and melt instability
Three-dimensional modelling of the floating zone (needle-eye) crystal growth process is carried out to analyse numerically the stability of the melt flow and the influence of the crystal rotation rate and inductor slit width on the 3D flow field and on the grown crystal resistivity. The unsteadiness of the melt is simulated and it is found that for the considered growth parameters a steady-state flow can be a reasonable approximation to the unsteady melt motion. The parametric studies have shown that increasing the rotation rate essentially changes the flow pattern and weakens the rotational striations, while the inductor slit width has a more local influence on these characteristics.
Keywords:computer simulation;fluid flows;mass transfer;floating zone technique;semiconducting silicon