화학공학소재연구정보센터
Journal of Crystal Growth, Vol.227, 950-954, 2001
Optical in situ monitoring of complex oxide thin film laser molecular beam epitaxy
We report the optical in situ monitoring results of the laser molecular beam epitaxial growth of complex oxide thin films using an oblique-incidence reflectance difference (OIRD) technique. The sub-monolayer sensitivity, optical interference oscillations, monolayer response observed for heteroepitaxy, and the surface kinetics study of OIRD measurement are presented. By using a four-layer stack model, the interference oscillations and the monolayer response are reproduced with Fresnel's formulas for multi-layers.