Journal of Crystal Growth, Vol.227, 161-166, 2001
Critical layer thickness study in In0.75Ga0.25As/In0.5Al0.5As pseudomorphic resonant tunneling diode structure grown on GaAs substrates
We have studied critical layer thickness (CLT) in an In0.75Ga0.25As resonant tunneling diode structure grown on a GaAs substrate, ia an InAlAs step-graded buffer (SGB) with two types of inverse step(IS)-SGB. We have observed red or blue shift in photoluminescence spectra and CLT change depending on SGB condition. This change reflects from the difference of residual strain InAlAs SGBs adopted here.,(C) 2001 Elsevier Science B.V. All rights reserved.
Keywords:low dimensional structure;molecular beam epitaxy;arsenates;semiconducting III-V materials;heterojunction semiconductor devices