Studies on the effect of substrate temperature on (VI-VI) textured tungsten oxide (WO3) thin films on glass, SnO2 : F substrates by PVD : EBE technique for electrochromic devices

Sivakumar R; Jayachandran M; Sanjeeviraja C

Materials Chemistry and Physics, Vol.87, No.2-3, 439-445, 2004

DOI10.1016/j.matchemphys.2004.06.028 Export Citation

Studies on the effect of substrate temperature on (VI-VI) textured tungsten oxide (WO3) thin films on glass, SnO2 : F substrates by PVD : EBE technique for electrochromic devices

Sivakumar R, Jayachandran M, Sanjeeviraja C

Electrochromic VI-VI compound semiconductor tungsten oxide (WO3) thin films have pronounced feature in electrochromic devices. These films have been prepared by employing one of the physical vapour deposition methods (PVD), i.e., electron beam evaporation technique (EBE) at different substrate temperatures. The effects of substrate temperature on structural, surface morphological and optical properties of the films are studied. (C) 2004 Elsevier B.V. All rights reserved.

Keywords:thin films;evaporation;electron microscopy (SEM);optical properties