This study investigated the effect of the surfactant and the concentration of SiC particle on the codeposition of SiC in the Ni layer. Experimental results showed that the addition of cetyltrimethylammonium bromide (CTAB) can reduce the agglomerization of SiC particles in the plating bath so that a high percentage of uniformly distributed SiC particles can be deposited. The adsorption of surfactant CTAB on the SiC particles increases with increasing concentration of CTAB. The enhancement of adhesion between particles and the cathode increases the possibility of embedding larger particles. The effect of surfactant on the codeposition behaviors of SiC particles was explained through the concept of effective particle. (C) 2004 Elsevier B.V. All rights reserved.