Tin-doped In2O3 (ITO) thin films were prepared by reactive evaporation from new pulverulent mixture of indium oxide, tin oxide and metallic indium at different partial pressures of oxygen. The films were annealed in a secondary vacuum just after deposition. Under optimal conditions of evaporation, these films are stoichiometric, show a good crystallinity and feature high transmission in visible region (T > 90%) and high reflection in near IR region versus oxygen pressure.