To produce micrometer scale chemical patterns, a new method is developed. In this method, silica beads are used as a mask of an underneath substrate. We produced the patterns with CH3- and COOH-terminated regions and compared them with similar patterns prepared by the microcontact printing (mu CP) method. The advantage of this technique over mu CP is that monolayers with higher chemical purity can be patterned: thus it provides ideal and well-defined standard samples for surface chemical imaging such as chemical force microscopy.