A magnetic microdeflector was developed for the electron beam microcolumn system to control the electron beam. deflection/scanning. The magnetic microdeflector fabricated by the microelectromechanical system technology consists of four magnetic poles coupled with solenoid-type micromachined inductors with NiFe permalloy magnetic cores. The four magnetic poles are divided into two pairs which control the electron beam deflection/scanning in X and Y axes, respectively. Experimental results show that the electron beam deflection increases. linearly to 210 Am with a driving current of. 50 mA and an electrical power consumption of 3 mW. The fabricated magnetic microdeflector has a good dynamic property, as shown by the rise time of 25 ns with respect to a 50 mA step signal. The developed magnetic deflector demonstrates excellent performance in controlling the. electron beam deflection/scanning for the electron beam microcolumn system. (c) 2007 American Vacuum Society.