A multi layer nanostructure of 728 alternating WSi2 and Si layers with thicknesses gradually increasing from 10 to similar to 58 nm according to the Fresnel zoneplate formula has been fabricated using dc magnetron sputtering. This structure was analyzed with a scanning electron microscope (SEM) and tested with 19.5-keV synchrotron X-rays after sectioning and polishing. Line focus sizes as small as 30.6 nm have been achieved using a sectioned multilayer in transmission diffraction geometry. (c) 2006 Elsevier B.V. All rights reserved.