Electrochemical deposition of aluminum from basic and acidic molten NaCl-KCl-AlCl3 mixture on a graphite electrode at 140 degrees C was studied by voltammetry, chronopotentiometry and constant current deposition. The deposition of aluminum was found to proceed via a nucleation/growth mechanism in basic melt, while it was found to be diffusion controlled in acidic melt. The diffusion coefficient calculated for Al2Cl-(7) ions in acidic melt by voltammetry was in agreement with the deductions of voltammetry. The morphology of the aluminum deposits was examined using a metallographic microscope and by SEM. It was shown that, depending on the current density (c.d.) and AlCl3 concentration (acidic or basic melt) different aluminum morphologies were evident but a silver-bright, compact, and very stable metallic form of aluminum deposit was obtained in acidic melt with KI addition as surfactant.