Previous Article Next Article Table of Contents Journal of the American Chemical Society, Vol.128, No.30, 9638-9639, 2006 DOI10.1021/ja063272w Export Citation Atomic layer deposition of tungsten(III) oxide thin films from W-2(NMe2)(6) and water: Precursor-based control of oxidation state in the thin film material Dezelah CL, El-Kadri OM, Szilagyi IM, Campbell JM, Arstila K, Niinisto L, Winter CH Please enable JavaScript to view the comments powered by Disqus.
