Inorganic-organic hybrid glass nanoimprint has been demonstrated by the transformation of polysilane polymer into SiO2-based material. The proposed technique has the advantages of low temperature and very short processing time over conventional inorganic patterning methods. Line and space structures ranging from 50 nm to 25 mu m could be precisely patterned, and an aspect ratio of 4.8 was achieved for an optimized imprint condition. Only 5% shrinkage of the structure was confirmed after heat treatment at 350 C. The patterned film shows little solubility in acetone, acid, or alkali solution. Furthermore, only a very small change is observed when it is dipped in hydrofluoric acid. It was demonstrated that the proposed process enables nanopatterning of inorganic-organic hybrid glass with good thermal and chemical durabilities. (c) 2006 American Vacuum Society.