Journal of Vacuum Science & Technology B, Vol.24, No.3, 1318-1321, 2006
Growth and characterization of a high-purity ZnO nanoneedles film prepared by microwave plasma deposition
A high-density crystalline ZnO nanoneedles film (similar to 5 mu m thick) has been fabricated using a microwave plasma enhanced chemical vapor deposition apparatus. The nanostructures and properties were examined by scanning electron microscopy, high resolution transmission electron microscopy, and x-ray diffraction. The results indicated that the ZnO nanoneedle possesses a wurtzite structure (hexagonal) with lattice constants of a(o)=3.24 angstrom and C-0=5.19 angstrom, and an average length up to 5 mu m, while the diameters of the tip and the pillar of the nanoneedle are of similar to 30 and similar to 300 nm, respectively. The film density reaches similar to 10(11) cm(-2). The room-temperature photoluminescence spectrum reveals a strong and sharp near-UV emission band at 386 nm and exhibits a very weak deep-level emission, which implies the high-purity nature of the ZnO nanoneedles film. The high specific surface of ZnO nanoneedles film has potential applications in chemical sensors while the excitation property has optoelectronic and photochemical applications. (c) 2006 American Vacuum Society.