A study of the temperature dependence of the electron beam induced deposition (EBID) of tungsten was carried out in a temperature range of -30-75 degrees C under two conditions of beam energy and beam current using WF6 as the precursor gas. An Arrhenius relationship was found for the temperature dependence of the deposition rate which is consistent with an electron stimulated desorption mechanism for this process. In addition, the mechanism for EBID under different conditions was discussed. (c) 2006 American Vacuum Society.