The paper deals with the prediction of current distributions at patterned electrodes in the presence of forced laminar flow. The pattern considered consisted of a series of parallel tracks oriented perpendicularly to the flow and submitted to copper deposition from a sulphuric bath. The active features - 35 mu m high and 80 mu m wide - are relevant to the production processes for micromechanical and electronic applications. Due to the fair conductivity of the bath and the small dimensions of the features, the overvoltage was shown to be uniform within less than one millivolt over the patterned region of the cathode. Therefore ed distributions on the vias could be calculated regardless of the potential distribution. Flow patterns, concentration profiles and ed distributions are discussed depending on the average velocity of the fluid, the current applied, and the distance between two neighbouring tracks. Whereas the flow patterns are perfectly symmetrical due the low Reynolds in the cavity, concentration gradients and current densities are quite higher on the downstream part of the cavity, due to the presence of the inactive zone between the tracks.