Journal of Vacuum Science & Technology B, Vol.24, No.2, 750-755, 2006
Gas phase chemomechanical modification of silicon
In this work we demonstrate the gas phase chemomechanical functionalization of silicon. This work streamlines the preparation of chemomechanically modified surfaces, in comparison with previously described liquid phase modifications. Scribing was performed in the presence of ethylene, acetylene, and a control (air). X-ray photoelectron spectroscopy, wetting, and time-of-flight secondary ion mass spectrometry (scores and loadings from principal components analysis) results are consistent with expectations and with previous analysis of samples scribed under liquid alkenes and alkynes. Thermal desorption spectroscopy analysis supports the Si(100) model for scribed silicon. (c) 2006 American Vacuum Society.