Fluoropolymer films were deposited by plasma polymerization of 1.1.1-trifluoroethane (CF3-CH3). CF3-CH3 plasma polymerization characteristics and deposition rate of the polymer film were studied using a common industrial parallel-plate plasma reactor. The chemical structure of the CF3-CH3 plasma polymer film was analyzed by FTIR and XPS techniques. The study shows that CF3-CH3 plasma polymerization is divided into two regions: energy deficient and monomer deficient. The deposition rate of the polymer film (R,) increased with an increase of W/F-m, reached a maximum value, and then decreased. Analysis of the chemical structure indicates that the CF3-CH3 plasma polymer is CF3, CF2, CF, C-CFn, C-C groups, possessing a cross-linking network structure.