화학공학소재연구정보센터
Korean Journal of Chemical Engineering, Vol.23, No.3, 441-446, May, 2006
Plasma modification on a Nafion membrane for direct methanol fuel cell applications
E-mail:
This research focuses on Nafion modification using plasma techniques for direct methanol fuel cell applications. The results indicated the both argon (Ar) and carbon tetrafluoride (CF4) plasma treatments modified the Nafion surface substantially without altering the bulk properties. The Nafion surface exposed to CF4 plasma resulted in a more hydrophobic layer and an even lower MeOH permeability than the Ar-treated membrane. The plasma operating conditions using CF4 were optimized by utilizing an experimental design. The minimum MeOH permeability was reduced by 74%. The conductivity was 1-2×10-3 S/cm throughout the entire experimental range. Suppressed MeOH permeability can be achieved while maintaining the proton conductivity at a satisfactory level by adjusting the plasma operating conditions.
  1. DAgostino R, Cramarossa F, Fracassi F, De Simoni E, Sabbatini L, Zambonin PG, Caporiccio G, Thin Solid Films, 143, 163 (1986) 
  2. ASTM, Annual book of ASTM standards, Designation D 638-91: Standard test method for tensile properties of plastics, American Society for Testing and Materials, West Conshohocken, PA, USA (1994)
  3. Carretta N, Tricoli V, Picchioni F, J. Membr. Sci., 166(2), 189 (2000) 
  4. Choi WC, Kim JD, Woo SI, J. Power Sources, 96(2), 411 (2001) 
  5. DuPont, Dupont Nafion PFSA Membranes. Product Information NAE101, Fayetteville, North Carolina, USA. p.2, Feb. (2004)
  6. Elabd YA, Napadensky E, Sloan JM, Crawford DM, Walker CW, J. Membr. Sci., 217(1-2), 227 (2003) 
  7. Damay F, Klein LC, Solid State Ion., 162, 261 (2003)
  8. Feichtinger J, Galm R, Walker M, Baumgartner KM, Schulz A, Rauchle E, Schumacher U, Surf. Coat. Technol., 142, 181 (2001) 
  9. Heinzel A, Barragan VM, J. Power Sources, 84(1), 70 (1999) 
  10. Hobson LJ, Ozu H, Yamaguchi M, Hayase S, J. Electrochem. Soc., 148(10), A1185 (2001) 
  11. Kim B, Kwon KH, Kwon SK, Park JM, Yoo SW, Park KS, You IK, Kim BW, Thin Solid Films, 426(1-2), 8 (2003) 
  12. Kim J, Kim B, Jung B, J. Membr. Sci., 207(1), 129 (2002) 
  13. Lee S, Kim D, Lee J, Chung ST, Ha HY, Korean J. Chem. Eng., 22(3), 406 (2005)
  14. Li L, Zhang J, Wang YX, J. Membr. Sci., 226(1-2), 159 (2003) 
  15. Lue SJJ, Juang HJ, Hou SY, Sep. Sci. Technol., 37(2), 463 (2002) 
  16. Lue SJ, Shih TS, Wei TC, “Surface modification on a Nafion membrane under Ar and CF4 plasmas,” in preparation (2006)
  17. Ma ZQ, Cheng P, Zhao TS, J. Membr. Sci., 215(1-2), 327 (2003) 
  18. Manea C, Mulder M, J. Membr. Sci., 206(1-2), 443 (2002) 
  19. Montgomery DC, Design and analysis of experiments, fifth ed., John Wiley, New York (2001)
  20. Pak C, Lee SJ, Lee SA, Chang H, Korean J. Chem. Eng., 22(2), 214 (2005)
  21. Sauk J, Byun J, Kang Y, Kim H, Korean J. Chem. Eng., 22(4), 605 (2005)
  22. Scott K, Taama WM, Argyropoulos P, J. Membr. Sci., 171(1), 119 (2000) 
  23. Walker M, Baumgartner KM, Feichtinger J, Kaiser N, Rauchle E, Kerres J, Surf. Coat. Technol., 116, 996 (1999) 
  24. Woo Y, Oh SY, Kang YS, Jung B, J. Membr. Sci., 220(1-2), 31 (2003) 
  25. Yin Y, Fang JH, Cui YF, Tanaka K, Kita H, Okamoto K, Polymer, 44(16), 4509 (2003) 
  26. Zeng R, Pang ZC, Zhu HS, J. Electroanal. Chem., 490(1-2), 102 (2000)