Factors influencing the transferred image resolution in 1:1 electron projection lithography system are considered. The influence of Coulomb interaction between electrons, gradient of magnetic field, and angle between focusing electric and magnetic fields on the electron-beam focusing is estimated. In the presence of a magnetic-field gradient in. the focusing system, the radius of an electron's orbit is changed with a change of value of magnetic field B. As a result, after completing a whole turn, the center of electron's orbit moves in the direction perpendicular to B and the magnetic-field gradient, which results in distortion of the transferred image. Coulomb interaction between electrons during their flight from the emitter toward the e-beam resist-coated wafer also results in diffusion of the transferred image and may be considered a crucial parameter that limits the high-resolution capability in the case of high emission currents. The presence of the angle between the direction perpendicular to the wafer and emitter planes and the magnet's field direction results in an overall displacement of the transferred image and a variation of cyclotron orbit radius that depends on the distance between the emitter and wafer. (c) 2006 American Vacuum Society.