Improvements in the fabrication technology of planar micro- and nano-fluidic systems are continually being sought. In this work, we demonstrate and characterize a potential method for making planar nano-fluidic channels in cross-linked UV-3 resist using a single-step electron-beam lithography process. Earlier work indicated that the fluids used in the resist development process influenced the final form of the nano-fluidic structures. In this study the development, rinsing and drying conditions for the resist processing have been investigated in detail to find the best conditions for channel formation. The process was then exploited to construct more complex planar nano-fluidic features, including Y- and T-shaped junctions that are required for practical systems. (c) 2005 American Vacuum Society.