An immersion scheme is used to improve resolution, exposure latitude, and depth-of-focus in zone-plate-array lithography (ZPAL). We believe this is the first implementation of an immersion scheme in a maskless lithography system. Replacing air with de-ionized water as the medium between the zone-plate array and the substrate effectively increases the system's numerical aperture and consequently, enhances its patterning capabilities. The design and fabrication process of an immersion zone plate is described. Its behavior is then characterized through the experimental reconstruction of its point-spread function, and compared to the theoretical model. A wide variety of patterns were printed, demonstrating the improved lithographic performance of immersion ZPAL. (c) 2005 American Vacuum Society.