A micropatterning process for ZnO on self-assembled monolayer (SAM) templates has been investigated with a time-of-flight secondary ion mass spectrometry (TOF-SIMS) technique. A phenyl-trichloro-silane (PTCS) SAM was exposed to UV light through a photomask and the resultant SAM template was catalyzed using Pd/Sn colloid. ZnO was deposited on the catalysts in an aqueous solution of zinc nitrate and dimethylamine-borane. Ion distribution in the samples in each intermediate process step was successfully imaged using TOF-SIMS with a Ga+ beam focused to about 100 nm in diameter. Organo-silane ions were detected on the PTCS-SAM and their signal intensities decreased with UV-irradiation time, which was consistent with infrared spectroscopy and wetting angle measurements data, revealing that PTCS was modified by UV. Selective adhesion of the Pd/Sn catalysts to the non-UV-irradiated SAM regions and the further deposition of ZnO with boron on the catalyzed regions were clearly exhibited by TOF-SIMS. The amount of boron in ZnO estimated from the SIMS results roughly agreed with the chemical analysis data. (c) 2006 The Electrochemical Society.