Plasma polymerization of allylamine is performed both in continuous wave and pulsed mode. Chemical derivatization is applied to determine primary and secondary amine concentration. Primary amines are efficiently formed, but secondary amines are more abundant. A polymerization mechanism is proposed to account for the difference in amine content obtained from comparison between continuous wave and pulsed mode plasma polymerization. The AFM measurements performed on ultrathin (1-10 nm) plasma polymers confirm the continuity of films and that the film growth on silicon occurs via a layer-by-layer mechanism because no islandlike structures were detected.