Electrodeposition of gold mesoparticles on anodized and chemically etched alummum/copper films deposited on silicon wafers proceeds by instantaneous nucleation and with no diffusion limitations. Both of these phenomena favor the formation of relatively monodispersed gold particles. Under the reported electrodeposition conditions, the relative standard deviation of the particle diameter is 25%. The particle coverage is 7 x 10(8) particles cm(-2). The mean particle diameter varies as a function of electrodeposition time in the range of 40-80 nm. Optical constants of gold mesoparticles are resolved by spectroscopic ellipsometry. A two-layer optical model is constructed to determine both extinction coefficients and refractive indexes of gold mesoparticles as a function of the mean particle diameter. The absorption peak, associated with surface plasmons, is modeled with two Lorentz oscillators. Absorption peak maximums shift from 610 to 675 nm as the mean particle diameter increases from 42 to 74 nm. Electrodeposition of gold particles on technologically relevant substrates, such as aluminum/copper films, is expected to increase the utility of gold particles and facilitate their incorporation in nanostructured materials and a variety of electronic and optical devices.