Journal of Materials Science, Vol.40, No.13, 3543-3544, 2005
Application of N-2/Ar inductively coupled plasma to the photoresist ashing for low-k dielectrics
Kim HW,
Myung JH,
Kim NH,
Yoo CG,
Suh KW,
Kim SK,
Choi DK,
Chung CW,
Kang CJ,
Park WJ,
Park SG,
Lee JG
