Pattern formation through selective chemical transformation of self-assembled benzaldimine monolayer by soft X-ray irradiation (vol 282, pg 241, 2005)

Jung YJ; Kim JI; Kang TH; Ihm K; Kim KJ; Kim B; Park JW

Journal of Colloid and Interface Science, Vol.287, No.1, 371-371, 2005

DOI10.1016/j.jcis.2005.04.028 Export Citation

Pattern formation through selective chemical transformation of self-assembled benzaldimine monolayer by soft X-ray irradiation (vol 282, pg 241, 2005)

Jung YJ, Kim JI, Kang TH, Ihm K, Kim KJ, Kim B, Park JW