Journal of Colloid and Interface Science, Vol.285, No.2, 711-718, 2005
Comparison of resistance to protein adsorption and stability of thin films derived from alpha-hepta-(ethylene glycol) methyl omega-undecenyl ether on H-Si(111) and H-Si(100) surfaces
Oligo(ethylene glycol)-terminated thin films were prepared by photo-induced hydrosilylation of alpha-hepta-(ethylene glycol) methyl omega-undecenyl ether (EG(7)) on hydrogen-terminated silicon(111) and (100) surfaces. Their resistance to protein adsorption. and stabilities (from hours to days) under a wide variety of conditions, such as air, water, biological buffer, acid. and base, were investigated using contact-angle goniometry and ellipsometry techniques. Results indicated higher stability of the films chemisorbed on Si(111) than on Si(100). Furthermore. micron-sized patterns were fabricated on the films via AFM anodization lithography. Using atomic force microscopy (AFM) and fluorescence microscopy. we demonstrated that various proteins including fibrinogen, avidin, and bovine serum albumin (BSA) predominately adsorbed onto the patterns. but not the rest of the film surfaces. (c) 2004 Elsevier Inc. All rights reserved.
Keywords:oligo(ethylene glycol)-terminated thin films;hydrogen-terminated silicon surfaces;photo-induced surface hydrosilylation;protein adsorption;AFM anodization lithography;stability