In this paper, we study the characteristics of titanium oxide films deposited on stainless by titanium ethoxide. The titanium oxide films deposited on stainless has only Ti-O band at 400 ~ 1000 cm-1 range. The deposition rate of titanium oxide films gradually increased with deposition time and RF power, it was decreased, however, after the condition of 250 watt, 30min and 40 min by the ablation and the etching.