Journal of Vacuum Science & Technology B, Vol.22, No.6, 3522-3524, 2004
Dependence of acid generation efficiency on the protection ratio of hydroxyl groups in chemically amplified electron beam, x-ray and EUV resists
In chemically amplified resists for ionizing radiation such as an electron beam, protons. of acids come from not acid generators but base polymers. This means that the modification of base polymers has a great effect on the acid generation efficiency. The relation between relative acid yield and protecting groups of poly(4-hydroxystyrene) was examined. The selection of protecting groups is important for the acid generation efficiency and the acid distribution uniformity. (C) 2004 American Vacuum Society.