Templates for imprint lithography and MxL (molecular transfer lithography) are generated by adhesion of a spin-cast film of polyvinyl alcohol (PVA) to a carrier comprised of materials selected for conformability or distortion reduction. Template formation using both polymeric carrier materials and rigid materials, including quartz and glass carrier materials. is demonstrated. The absence of a carrier material altogether to form a suspended thin film is shown to be feasible. The rigid template material is formed by bonding the PVA patterned film to a rigid carrier while still connected to the master pattern, and it is demonstrated that separation occurs at the PNIA-sificon master pattern interface. Form factors for the templates include a 25 turn X 25 mm. patterned film attached to a 65 mm X 65 mm glass substrate, a full 100 mm pattern bonded to a quartz substrate, and a 100 mm mask of Mylar(TM) bonded with a patterned PVA film for MxL applications. These carrier materials are developed in a form factor compatible with commercial nanoimpfint lithography tools, and for standard contact aligners adapted to perform tAx-L processing. (C) 2004 American Vacuum Society.