A new negative-working and alkaline-developable photosensitive polyimide precursor based on poly(amic acid) (PAA), 4,4'-methylenebis[2,6-bis(hydroxymethyl)]phenol (MBHP) as a crosslinker, and a photoacid generator (5-propyisulfonyloxy-imino-5H-thiophen-2-ylidene)-2-(methylphenyl)aceton itrile (PTMA) has been developed. PAA was prepared by ring-opening polymerization of pyromellitic dianhydride with 4,4'-oxydianiline. The photosensitive polyimide precursor containing PAA (65 wt %), MBHP (25 wt %), and PTMA (10 wt %) showed a clear negative image featuring 10 m line and space patterns when it was exposed to 436 nm light at 100 mJ(.)cm(-1), post-exposure baked at 130 degreesC for 3 min, followed by developing with a 2.38 wt % aqueous tetramethylammonium hydroxide solution at 25 degreesC. (C) 2004 Wiley Periodicals, Inc.