화학공학소재연구정보센터
Thin Solid Films, Vol.457, No.1, 201-208, 2004
Numerical analysis of oxygen induction thermal plasmas with chemically non-equilibrium assumption for dissociation and ionization
Modeling of induction thermal plasmas has been performed to investigate a chemically non-equilibrium effect for dissociation and ionization. Computations were carried out for oxygen plasmas under atmospheric pressure. The thermofluid and concentration fields were obtained by solving of two-dimensional modeling. This formulation was presented using higher-order approximation of the Chapman-Enskog method for the estimation of transport properties. A deviation from the equilibrium model indicates that oxygen induction plasmas should be treated as non-equilibrium for dissociation and ionization. The present modeling would give the guidance for the rational design of new material processing using thermal plasmas. (C) 2003 Elsevier B.V. All rights reserved.