A high-density and uniform line-plasma source is developed by an inductive rf discharge using a rectangular discharge chamber (200 X 100 X 20 mm) with a pair of permanent magnets placed on top and bottom of the chamber. Ion-saturation current-density J(is) profile is controlled by varying the width of the magnets and the distance between the antenna and the magnets. A 140-mm-wide plasma [plasma density similar or equal to(1.8-2.5) X 10(12) cm(-3) for electron temperature =4-8 eV] of a uniformity variation within 90% is produced using a 140-mm-long antenna for an Ar pressure of 20 mTorr and a rf power of 3 kW. The measured Jis profiles are explained by solving the equation of motion for electrons under a magnetic field structure of longitudinal line cusps. (C) 2004 American Vaccum Society.