TiN films on stainless steel have been synthesized by arc deposition with dc and pulsed biases. We show that at the same bias (-300 V), coarse particles on the film surface are significantly decreased both in size and in amount, if the bias is pulsed. In order to clarify the related process, we have analyzed, using orthogonal design, the influences from different working parameters. We show that the parameters related to the pulsed bias such as magnitude and duty cycle have important effects on the size distribution of the particles. According to our theoretical calculations based on plasma sheath and dust plasma theories, the origin of the droplet elimination lies in enhanced repulsion of the negatively charged droplets in pulsed plasma. (C) 2004 American Vacuum Society.