Multiloop PID Controller Design using Partial Least Squares Decoupling Structure

Junghui Chen; Yi-Chun Cheng; Yuezhi Yea

Korean Journal of Chemical Engineering, Vol.22, No.2, 173-183, March, 2005

DOI10.1007/BF02701481 Export Citation

Multiloop PID Controller Design using Partial Least Squares Decoupling Structure

Junghui Chen^†, Yi-Chun Cheng, and Yuezhi Yea

Department of Chemical Engineering, Chung-Yuan Christian University, Chung-Li, 320, Taiwan

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The goal of this paper is to identify and control multi-input multi-output (MIMO) processes by means of the dynamic partial least squares (PLS) model, which consists of a memoryless PLS model connected in series with linear dynamic models. Unlike the traditional decoupling MIMO process, the dynamic PLS model can decompose the MIMO process into a multiloop control system in a reduced subspace. Without the decoupler design, the optimal tuning multiloop PID controller based on the concept of general minimum variance and the constrained criteria can be directly and separately applied to each control loop under the proposed PLS modeling structure. Several potential applications using this technique are demonstrated.

Keywords:Partial Least Squares;Multiloop;PID Controllers;Adaptive Control;Multivariable Process

[References]

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BohimBobal VJ, Prokop R, Int. J. Adapt. Control Signal Process., 13, 671 (1999)
Cameron F, Seborg DE, Int. J. Control, 30, 401 (1983)
Gawthrop PJ, IEEE Trans. Autom. Control, 31, 201 (1986)
Garcia CE, Morari M, Ind. Eng. Chem. Process Des. Dev., 21, 308 (1982)
Chen J, Yen JH, Korean J. Chem. Eng., 20(6), 1000 (2003)
Chen JH, Yea YZ, Chem. Eng. Commun., 189(7), 865 (2002)
Eastment HT, Krzanowski W, Technometrics, 24, 73 (1982)
Han IS, Kim M, Lee CH, Cha W, Ham BK, Jeong JH, Lee H, Chung CB, Han C, Korean J. Chem. Eng., 20(6), 977 (2003)
Hoskuldsson A, J. Chemometr., 2, 211 (1988)
Kashiwagi H, Li Y, Korean J. Chem. Eng., 21(2), 329 (2004)
Kaspar MH, Ray WH, AIChE J., 38, 1539 (1992)
Kaspar MH, Ray WH, Chem. Eng. Sci., 48, 3447 (1993)
Kourti T, MacGregor JF, J. Qual. Technol., 28, 409 (1996)
Ku W, Storer RH, Georgakis C, Chemometrics Intell. Lab. Syst., 30, 179 (1995)
Lakshminarayanan S, Shah SL, Nandakumar K, AIChE J., 43(9), 2307 (1997)
Luyben WL, Ind. Eng. Chem., 25, 654 (1986)
Nahas EP, Henson MA, Seborg DE, Comput. Chem. Eng., 12, 1039 (1992)
Ortega R, Kelly R, IEEE Trans. Ind. Electron., 31, 312 (1984)
Oh SC, Yeo YK, Korean J. Chem. Eng., 12(4), 472 (1995)
Palmor ZJ, Halevi Y, Krasney N, Automatica, 31(7), 1001 (1995)
Proudfoot CG, Gawthrop PJ, Jacobs OLR, Proc. IEE. Pt-D, 130, 267 (1983)
Qin SJ, McAvoy TJ, A Data-Based Process Modeling Approach and Its Applications, in Proceedings of the 3rd IFAC Symposium on Dynamic and Control of Chemical Reactors, Distillation Columns, and Batch Process, Pergamon, Oxford (1992)
Radke F, Isermann R, Automatica, 23, 449 (1987)
Reeves DE, Arkun Y, AIChE J., 35, 603 (1989)
Shiu SJ, Hwang SH, Ind. Eng. Chem. Res., 37(1), 107 (1998)
Wittenmark B, Self-Tuning PID Controllers Based on Pole Placement, Lund Inst. of Technical Report, TFRT-7179 (1979)
Wolovich WA, Flab PL, SIAM J. Control Optim., 7, 437 (1969)
Zhuang M, Atherton DP, IEE Proc.-Control Theory Appl., 141(2), 111 (1994)
Zwick WR, Velicer WF, Psychol. Bull., 99, 432 (1986)

[Referenced By]

[1] Banyasz C, Keviczky L, J. Process Control, 3, 53 (1993)

[2] BohimBobal VJ, Prokop R, Int. J. Adapt. Control Signal Process., 13, 671 (1999)

[3] Cameron F, Seborg DE, Int. J. Control, 30, 401 (1983)

[4] Gawthrop PJ, IEEE Trans. Autom. Control, 31, 201 (1986)

[5] Garcia CE, Morari M, Ind. Eng. Chem. Process Des. Dev., 21, 308 (1982)

[6] Chen J, Yen JH, Korean J. Chem. Eng., 20(6), 1000 (2003)

[7] Chen JH, Yea YZ, Chem. Eng. Commun., 189(7), 865 (2002)

[8] Eastment HT, Krzanowski W, Technometrics, 24, 73 (1982)

[9] Han IS, Kim M, Lee CH, Cha W, Ham BK, Jeong JH, Lee H, Chung CB, Han C, Korean J. Chem. Eng., 20(6), 977 (2003)

[10] Hoskuldsson A, J. Chemometr., 2, 211 (1988)

[11] Kashiwagi H, Li Y, Korean J. Chem. Eng., 21(2), 329 (2004)

[12] Kaspar MH, Ray WH, AIChE J., 38, 1539 (1992)

[13] Kaspar MH, Ray WH, Chem. Eng. Sci., 48, 3447 (1993)

[14] Kourti T, MacGregor JF, J. Qual. Technol., 28, 409 (1996)

[15] Ku W, Storer RH, Georgakis C, Chemometrics Intell. Lab. Syst., 30, 179 (1995)

[16] Lakshminarayanan S, Shah SL, Nandakumar K, AIChE J., 43(9), 2307 (1997)

[17] Luyben WL, Ind. Eng. Chem., 25, 654 (1986)

[18] Nahas EP, Henson MA, Seborg DE, Comput. Chem. Eng., 12, 1039 (1992)

[19] Ortega R, Kelly R, IEEE Trans. Ind. Electron., 31, 312 (1984)

[20] Oh SC, Yeo YK, Korean J. Chem. Eng., 12(4), 472 (1995)

[21] Palmor ZJ, Halevi Y, Krasney N, Automatica, 31(7), 1001 (1995)

[22] Proudfoot CG, Gawthrop PJ, Jacobs OLR, Proc. IEE. Pt-D, 130, 267 (1983)

[23] Qin SJ, McAvoy TJ, A Data-Based Process Modeling Approach and Its Applications, in Proceedings of the 3rd IFAC Symposium on Dynamic and Control of Chemical Reactors, Distillation Columns, and Batch Process, Pergamon, Oxford (1992)

[24] Radke F, Isermann R, Automatica, 23, 449 (1987)

[25] Reeves DE, Arkun Y, AIChE J., 35, 603 (1989)

[26] Shiu SJ, Hwang SH, Ind. Eng. Chem. Res., 37(1), 107 (1998)

[27] Wittenmark B, Self-Tuning PID Controllers Based on Pole Placement, Lund Inst. of Technical Report, TFRT-7179 (1979)

[28] Wolovich WA, Flab PL, SIAM J. Control Optim., 7, 437 (1969)

[29] Zhuang M, Atherton DP, IEE Proc.-Control Theory Appl., 141(2), 111 (1994)

[30] Zwick WR, Velicer WF, Psychol. Bull., 99, 432 (1986)